Rezvani_6_5Substrate Isolation in 0.18um CMOS Technology G. Ali Rezvani and Jon Tao RF Micro Devices 2191 Zanker Rd. San Jose CA 95131 1 Outline 1- Introduction 2- Method of study 3- Coupling within Psub with Pwell 4- Impact of P+ Guard Ring 5- Impact of Deep Nwell 6- Impact separation of Deep Nwells 7- Comparison with SOI 8- Conclusion 2 1- Introduction CMOS Scaling resulted in high performance MOSFETs for RF applications. Lower cost of CMOS processing resulted in need for integration of RF, Analog, and Digital on the same die. (SOC) Three types of coupling among various blocks may become issues the way to SOC: A- Coupling thru Vdd and Vss B- Coupling thru Substrate C- Coupling thru Radiation Substrate Coupling is the subject of this talk 3 1- Introduction The purpose of this study has b……